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Solar Thin Film Photovoltaics
Search All Applications in Solar Thin Film Photovoltaics
Application US20190097074
Published 2019-03-28
Photovoltaic Cell
A photovoltaic cell may include a hydrogenated amorphous silicon layer including a n-type doped region and a p-type doped region. The n-type doped region may be separated from the p-type doped region by an intrinsic region. The photovoltaic cell may include a front transparent electrode connected to the n-type doped region, and a rear electrode connected to the p-type doped region. The efficiency may be optimized for indoor lighting values by tuning the value of the H2/SiH4 ratio of the hydrogenated amorphous silicon layer.
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- 1. A method, comprising:
depositing an interface material over a rigid substrate; depositing a precursor material over the interface material; thermally curing the precursor material to cause a diffusion of the interface material into the rigid substrate to form a reacted layer and to cause a diffusion of the precursor material into the interface material to form a non-reacted layer and a flexible substrate disposed over the non-reacted layer such that the non-reacted layer is interposed between the flexible substrate and the reacted layer; thermally cooling the reacted layer and the non-reacted layer following thermally curing the precursor material; separating the reacted layer from the non-reacted layer and the flexible substrate; and removing the non-reacted layer from the flexible substrate to expose a major surface of the flexible substrate.
- 14. A method, comprising:
depositing a conductive material over a flexible substrate, the conductive material forming a rear electrode of a photovoltaic cell; depositing a hydrogenated amorphous silicon layer over the rear electrode, wherein a bandgap of the hydrogenated amorphous silicon layer is less than 1.8 eV; and depositing a second conductive material over the hydrogenated amorphous silicon layer to form a front transparent electrode.
