Flisom, located in Switzerland, is developing a method for fabricating patterns on the surface of a layer of a thin-film device, which is advantageous for nanopatterning of devices without using templates and for the production of high-efficiency optoelectronic thin-film devices.
This sector is directed towards thin film photovoltaics, but does not include perovskite, organic, or nuclear photovoltaics or photoelectrochemical technologies.
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This sector is directed towards thin film photovoltaics, but does not include perovskite, organic, or nuclear photovoltaics or photoelectrochemical technologies.
